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Rinse / Wafer / Piranha solution / Properties of water / Sink / Recreational vehicle / Chemistry / Semiconductor device fabrication / Matter


Marvell NanoLab Member login Lab Manual Contents
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Document Date: 2013-01-15 18:58:26

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City

Bath / /

Company

UR E CO / Buffered HF / EPO / Important Operational Notes Metal / RCA / S co / /

Event

Product Issues / /

Facility

QRD station / Wafer Transfer Station / Transfer Station / Transferring Cleaned Wafers To Pre-Furnace Clean Station / SRD station / QDR station / /

IndustryTerm

gloves/chemical-resistant gloves/poly / chemical locker / metal tweezers / msink8 chemicals / chemical baths / designated chemical storage cabinet / chemical/gas vaults / chemical / dryer equipment / chemical-resistant gloves / chemicals / /

Organization

Revision History Chapter / RI NS / Marvell Nanolab / /

Position

QDR controller / TEMPERATURE CONTROLLER / Sink power controller / General / Heated Bath Temperature Controller / heater controller / controller / /

Product

cassettes / piece / cassette/handle / cassette bin / cassette / /

ProgrammingLanguage

L / K / /

Technology

alpha / MEMS / Av / /

SocialTag