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Materials science / Semiconductor device fabrication / Electronic engineering / Superhard materials / Condensed matter physics / Photoemission spectroscopy / Atomic layer deposition / Titanium nitride / Silicon dioxide / Chemistry / Emission spectroscopy / Matter


Photon Factory Activity Report 2009 #27 Part BSurface and Interface 2C/2008S2003 Annealing effects of in-depth profiles in TiN/LaO/HfSiO/SiO2/Si gate stack
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Document Date: 2010-12-27 22:22:07


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