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Microphotonic parabolic light directors fabricated by two-photon lithography J. H. Atwater, P. Spinelli, E. Kosten, J. Parsons, C. Van Lare et al. Citation: Appl. Phys. Lett. 99, [removed]); doi: [removed] Vie
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Document Date: 2011-10-19 18:33:40


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City

Madrid / Amsterdam / Pasadena / San Diego / /

Company

Thick Ag / The Netherlands Thomas J. Watson Laboratories / /

Country

United States / Spain / /

Currency

USD / /

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Facility

American Institute of Physics V Downloaded / Institute AMOLF / B. Weir / California Institute of Technology / American Institute of Physics / /

IndustryTerm

metal film / post-exposure processing / chemical change / thin-film processing / metal coating / optoelectronic applications / metal films / photonic devices / /

Organization

California Institute of Technology / American Institute of Physics / Light-Matter Interactions Energy Frontier Research Center / United States Department of Energy / Center for Nanophotonics / office of Science / /

Person

R. J. Fischer / Nat / K. Kim J. Lightwave Technol / J. H. Atwater / C. Van Lare / /

Position

Author / /

ProvinceOrState

California / /

PublishedMedium

APPLIED PHYSICS LETTERS / /

Technology

laser / broadband / lithography system / lasers / lithography / /

URL

http /

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