<--- Back to Details
First PageDocument Content
Semiconductor device fabrication / Photonics / Erbium / Ion implantation / Slot-waveguide / Optical fiber / Rutherford backscattering spectrometry / Waveguide / Silicon carbide / Chemistry / Materials science / Optics
Semiconductor device fabrication
Photonics
Erbium
Ion implantation
Slot-waveguide
Optical fiber
Rutherford backscattering spectrometry
Waveguide
Silicon carbide
Chemistry
Materials science
Optics

Add to Reading List

Source URL: www.epj-conferences.org

Download Document from Source Website

File Size: 1,24 MB

Share Document on Facebook

Similar Documents

Proceedings of the XI International Conference on Ion Implantation and other Applications of Ions and Electrons — ION 2016 Kazimierz Dolny, Poland, June 13–16, 2016 Editors of the Proceedings:

DocID: 1v7cn - View Document

Porous Surface on NiTi Alloy Produced by Plasma Ion Implantation

DocID: 1uHko - View Document

Titanium Oxide Layers Prepared by Metal Plasma Immersion Ion Implantation and Deposition as Hemocompatible Surfaces

DocID: 1u5Re - View Document

Structure and Properties of Titanium-Based Coatings prepared by Metal Plasma Immersion Ion Implantation and Deposition I. Tsyganov, M. F. Maitz1, E. Wieser1, E. Richter1 and H. Reuther1 Lipetsk State Technical University

DocID: 1tZXb - View Document

Surface treatment by ion implantation

DocID: 1q81c - View Document