A Place-and-Route Paradigm Shift: Detailed-Route-Centric Solution Now Required Each technology node adds tougher physical design challenges and more stringent design rules. Modern lithography requires dual patterning and - Node - Document - PDFSEARCH.IO

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	A Place-and-Route Paradigm Shift: Detailed-Route-Centric Solution Now Required Each technology node adds tougher physical design challenges and more stringent design rules. Modern lithography requires dual patterning and Add to Reading List Document Date: 2018-10-02 12:52:32 Open Document File Size: 386,37 KB Share Result on Facebook

A Place-and-Route Paradigm Shift: Detailed-Route-Centric Solution Now Required Each technology node adds tougher physical design challenges and more stringent design rules. Modern lithography requires dual patterning andAdd to Reading List