Nanoelectronics

Results: 683



#Item
241Microtechnology / Tetramethylammonium hydroxide / Semiconductor device fabrication / Etching / Photoresist / Glove / Rinse / Personal protective equipment / Chemistry / Materials science / Clothing

NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual ______________________________________________ Wet Station G: TMAH Anisotropic Silicon Etch,

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Source URL: mfz140.ust.hk

Language: English - Date: 2014-09-24 23:25:14
242Technology / Visual arts / Microtechnology / Rinse / Glove / Personal protective equipment / Cleanroom / Industrial etching / Semiconductor device fabrication / Etching / Clothing

NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual Ultra Fab Wet Station F –Non-standard Processing Station

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Source URL: mfz140.ust.hk

Language: English - Date: 2014-09-24 23:25:14
243Materials science / Sputtering / Plasma processing / Chemistry / Manufacturing / Technology / Sputter deposition / Thin film deposition / Semiconductor device fabrication / Coatings

NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST Standard Operating Manual ___________________________________________________________ Denton Explorer 14 RF/DC Sputter

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Source URL: mfz140.ust.hk

Language: English - Date: 2014-11-23 23:21:05
244Physical organic chemistry / Nanoelectronics / Chemical bonding / Molecular electronics / Alkane stereochemistry / Alkane / Chemical bond / Conformational isomerism / Break junction / Chemistry / Organic chemistry / Stereochemistry

Study demonstrates an electronic switch based on stereoisomerism

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Source URL: phys.org

Language: English - Date: 2015-04-16 20:11:59
245Resist / Personal protective equipment / Semiconductor device fabrication / Rinse / Wafer

NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual PEL Wet Station X –Clean Organic Solvent Station Version 1.0 

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Source URL: mfz140.ust.hk

Language: English - Date: 2014-09-24 23:25:15
246Glove / Personal protective equipment / Clothing / Semiconductor device fabrication / Rinse

NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual SCP Wet Station Z –Semi-clean Developing Station Version 1.0 

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Source URL: mfz140.ust.hk

Language: English - Date: 2014-09-24 23:25:16
247Energy / Energy conversion / Energy harvesting / Solar cell / Nanowire / Thin film solar cell / Fovea centralis / Funnels / Silicon / Chemistry / Technology / Nanoelectronics

Silicon micro-funnels increase the efficiency of solar cells

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Source URL: phys.org

Language: English - Date: 2015-04-16 12:48:48
248Wafer / Rinse / Resist / Semiconductor device fabrication / Technology / Etching

NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual ______________________________________________ PEL Wet Station W –Non-Standard Organic Solvent Station

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Source URL: mfz140.ust.hk

Language: English - Date: 2014-09-24 23:25:15
249CityRail / Chatswood /  New South Wales / Rail Corporation New South Wales / Eastern Suburbs & Illawarra railway line / Railways in Sydney / Bus routes in Sydney / Transport in New South Wales / Rail transport in Australia / Rail transport in New South Wales

NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual ______________________________________________ UltraFab Wet Station B –Non-CMOS Cleaning Station

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Source URL: mfz140.ust.hk

Language: English - Date: 2014-09-24 23:25:11
250Technology / Electronics / Etching / Timer / Microtechnology / Semiconductor device fabrication / Materials science

NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual ______________________________________________ UltraFab Wet Station C – Oxide/ Nitride Etch Station

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Source URL: mfz140.ust.hk

Language: English - Date: 2014-09-24 23:25:12
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