© IMEC FEOL ETCH CHALLENGES, FROM PLANAR METAL GATES TOWARDS - Multigate device - Document - PDFSEARCH.IO

First Page	Meta Content
	© IMEC FEOL ETCH CHALLENGES, FROM PLANAR METAL GATES TOWARDS Add to Reading List Document Date: 2012-05-24 09:07:30 Open Document File Size: 1,96 MB Share Result on Facebook Company LAM RESEARCH / Ge / / Person VASILE PARASCHIV / WERNER BOULLART / / ProvinceOrState Maine / / Technology lithography / 2012 2 TECHNOLOGY / / SocialTag Microtechnology Extreme ultraviolet lithography Transistors Etching Multigate device IMEC Graphene High-k dielectric Polycrystalline silicon Materials science

© IMEC FEOL ETCH CHALLENGES, FROM PLANAR METAL GATES TOWARDSAdd to Reading List