PInS_MEMS_Process_Capabilities_Flyer.indd

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Date: 2015-04-10 06:26:25 Microtechnology Thin film deposition Etching Microelectromechanical systems Polycrystalline silicon Tetrafluoromethane Amorphous silicon Chemical vapor deposition Chemistry Materials science Semiconductor device fabrication		PInS_MEMS_Process_Capabilities_Flyer.indd Add to Reading List Source URL: www.innovationservices.philips.com Download Document from Source Website File Size: 692,90 KB Share Document on Facebook

	Hyperuniformity in amorphous silicon based on the measurement of the infinite-wavelength limit of the structure factor R. Xie1,#, G. G. Long1,2, S. J. Weigand3, S. C. Moss4,‡, T. Carvalho5, S. Roorda5, M. Hejna6, S. To DocID: 1vbDg - View Document
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