<--- Back to Details
First PageDocument Content
Materials science / Radiography / Synchrotron / LIGA / X-ray lithography / Microfabrication / X-ray / Physics / Electromagnetic radiation / Microtechnology
Date: 2009-09-24 21:03:45
Materials science
Radiography
Synchrotron
LIGA
X-ray lithography
Microfabrication
X-ray
Physics
Electromagnetic radiation
Microtechnology

V Contents List of Contributors VII 1

Add to Reading List

Source URL: www.wiley-vch.de

Download Document from Source Website

File Size: 75,51 KB

Share Document on Facebook

Similar Documents

Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb*, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH,

DocID: 1s9p8 - View Document

Chemistry / Materials science / Physics / Matter / Microtechnology / LIGA / X-ray lithography / Photoresist / Canadian Light Source / Resist / Beamline / Poly

Heat Load Experiments at CAMD and CLS D. Yemane1, S. Achenbach2, J. Goettert1, R. Guntaka3, D. Haluzan2, K. Nandakumar3, V. Singh1, V. Subramanian2, G. Wells2 1 LSU Center for Advanced Microstructures and Devices (CAMD),

DocID: 1rdcU - View Document

Semiconductor device fabrication / Rudolph Technologies /  Inc. / Electromagnetic radiation / Business / Electronic engineering / Ellipsometry / Wafer / Reliability / Immersion lithography / Automated X-ray inspection / Reflectometry / KLA-Tencor

2007 Annual Report nasdaq | rtec DE A R FE L LOW SH A R EHOL DER S The past year was a challenging one, as semiconductor device manufacturers over-estimated demand, particularly for

DocID: 1r5pV - View Document

Chemistry / Microtechnology / Materials science / Engineering / Polymers / LIGA / Semiconductor device fabrication / Microelectromechanical systems / Photoresist / Photolithography / SU-8 photoresist / Poly

Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD)

DocID: 1qVW9 - View Document

Chemistry / Materials science / Physics / Matter / Microtechnology / LIGA / X-ray lithography / Photoresist / Canadian Light Source / Resist / Beamline / Poly

Heat Load Experiments at CAMD and CLS D. Yemane1, S. Achenbach2, J. Goettert1, R. Guntaka3, D. Haluzan2, K. Nandakumar3, V. Singh1, V. Subramanian2, G. Wells2 1 LSU Center for Advanced Microstructures and Devices (CAMD),

DocID: 1qIzw - View Document