Back to Results
First PageMeta Content
Semiconductor device fabrication / Nanotechnology / Etching / Microelectromechanical systems / Transducers / Surface micromachining / Deep reactive-ion etching / Comb drive / Advanced Silicon Etch / Microtechnology / Materials science / Technology


POST-CMOS PROCESSING FOR HIGH-ASPECT-RATIO INTEGRATED SILICON MICROSTRUCTURES Huikai Xie*, Lars Erdmann*, Xu Zhu*, Kaigham J. Gabriel*† and Gary K. Fedder*† * Department of Electrical and Computer Engineering and †
Add to Reading List

Document Date: 2005-06-13 11:06:39


Open Document

File Size: 106,10 KB

Share Result on Facebook
UPDATE