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Thin film deposition / Semiconductor device fabrication / Chemical vapor deposition / Metalorganic vapour phase epitaxy / Thin film / Vacuum deposition / Epitaxy / X-ray photoelectron spectroscopy / Atomic layer deposition / Chemical vapor deposition of ruthenium


Journal of Undergraduate Research 3, Chemical Vapor Deposition of Nickel Ferrite Using Ni(C5 H5 )2 and Fe(C5 H4 C4 H9 )(C5 H5 ) M. A. Kimbell Department of Electrical Engineering, Rose-Hulman Institute of Techn
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Document Date: 2010-02-01 15:16:36


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File Size: 750,44 KB

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