| Document Date: 2014-10-20 07:40:27
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City Tokyo / Munich / Santa Clara / / Company Heidelberg Instruments GmbH / GenISys GmbH / / Country Germany / Japan / / / Event Business Partnership / M&A / / IndustryTerm process solutions / laser exposure systems / maskless laser lithography technology / process correction software packages / 3D simulation software / technology enabler / layout data processing / caliber software / laser lithography tools / correction technologies / micro-patterning technologies / precision maskless lithography systems / software platform combining clever layout data preparation / highperformance software solutions / lithography equipment / e-beam / related applications / software solutions / process correction software / lithography software packages / laser systems / equipment / / Organization BEAMER / / Person Steffen Diez / Nezih Unal / / / Position leader / Vice President / / ProvinceOrState California / / Technology Laser / MEMS / Lithography / simulation / maskless laser lithography technology / process control / correction technologies / micro-patterning technologies / / URL www.genisys-gmbh.com / http /
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PRESS RELEASE Heidelberg Instruments and GenISys Announce Cooperation on Maskless Laser Lithography Heidelberg, GERMANY, October 21, 2014 – Heidelberg Instruments, a leading supplier of equipment and process solutions