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Semiconductor device fabrication / Plasma physics / Plasma processing / Physics / Manufacturing / Electromagnetism / Reactive-ion etching / Plasma / Langmuir probe / Etching / Capacitor / Capacitively coupled plasma


Control of Ion Energy in a Capacitively Coupled Reactive Ion Etcher H. M. Park , C. Garvin, D. S. Grimard and J. W. Grizzle Electronics Manufacturing and Control Systems Laboratory, Dept. of Electrical Engineering and C
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Document Date: 2016-04-25 13:15:14


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File Size: 211,82 KB

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