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Materials science / Microtechnology / Polymers / Semiconductor device fabrication / X-ray lithography / Photolithography / LIGA / SU-8 photoresist / Photoresist / Nanolithography / Beamline / Electron-beam lithography


Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb*, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH,
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Document Date: 2012-08-02 10:08:48


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File Size: 609,15 KB

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