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Negative Resists for Ultra-Tall, High Aspect Ratio Microstructures S. Lemkea, P. Goetterta, I. Rudolpha, J. Goettertb,*, B. Löchela a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Institute for Nanom
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Document Date: 2012-08-02 10:05:16
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File Size: 395,71 KB
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