SP 2000 Sputter Deposition System

First Page		Document Content
Date: 2011-07-22 13:29:03 Technology Coatings Manufacturing Semiconductor device fabrication Thin films Sputter deposition Cavity magnetron Sputtering Ion source Chemistry Materials science Thin film deposition		SP 2000 Sputter Deposition System Add to Reading List Source URL: www.vptec.com Download Document from Source Website File Size: 108,34 KB Share Document on Facebook

	Perfect Scientific Manufacturing ダメージフリー回転マグネットスパッタ装置 Damage-Free Rotation Magnet Sputtering DocID: 1v4Rz - View Document
	Journal of Nuclear Materials 266±±227 Sputtering of beryllium, tungsten, tungsten oxide and mixed W±C layers by deuterium ions in the near-threshold energy range M.I. Guseva a, A.L. Suvorov DocID: 1uCY6 - View Document
	Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering Wenli DENG*, Taizo OHGI, Hitoshi NEJO and Daisuke FUJITA National Research Institute for Metals, 1-2-1 Sengen, Tsukuba, Japan DocID: 1s15G - View Document
	GD Dayafternoon & 16 September 2016 DocID: 1qWHG - View Document
	One-dimensional carrier profiling of blanket and confined semiconducting structures Promoter: Prof. Dr. Ir. W. Vandervorst Contact and daily advisor: Dr. Ir. J. Bogdanowicz () Required backgroun DocID: 1qdx8 - View Document