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Semiconductor device fabrication / Physics / Manufacturing / Vacuum / Coatings / Chemical vapor deposition / Plasma-enhanced chemical vapor deposition / Spectroscopy / Thin film / Chemistry / Thin film deposition / Plasma processing
Date: 2009-12-03 00:39:18
Semiconductor device fabrication
Physics
Manufacturing
Vacuum
Coatings
Chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Spectroscopy
Thin film
Chemistry
Thin film deposition
Plasma processing

PECVD HYDROGENATED AMORPHOUS CARBON FILMS: GROWTH AND CHARACTERIZATION ROZIDAWATI BINTI AWANG

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