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Date: 2014-10-10 03:22:20 Matter Plasma processing Thin film deposition Ceramic materials Semiconductor devices Negative bias temperature instability Chemical vapor deposition Amorphous silicon Polycrystalline silicon Chemistry Semiconductor device fabrication Manufacturing		CrossMark_Color_Stacked_p Add to Reading List Source URL: www.pskl.ust.hk Download Document from Source Website File Size: 588,64 KB Share Document on Facebook

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