OXFORD APPLIED RESEARCH High dissociation High quality films Uniform coverage

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Date: 2015-04-23 17:42:58 Manufacturing Astrophysics Plasma Plasma processing Thin film Nanoparticle Sputter deposition Physics Materials science Semiconductor device fabrication		OXFORD APPLIED RESEARCH High dissociation High quality films Uniform coverage Add to Reading List Source URL: www.oaresearch.co.uk Download Document from Source Website File Size: 1,39 MB Share Document on Facebook

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