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Date: 2014-07-22 13:23:02Chemistry Matter Manufacturing Ceramic materials Semiconductor device fabrication Thin film deposition Plasma processing Anions Chemical vapor deposition Silicon nitride Silicon dioxide Plasma-enhanced chemical vapor deposition | www.afm-journal.de www.MaterialsViews.com Seung-Kyun Kang, Suk-Won Hwang, Huanyu Cheng, Sooyoun Yu, Bong Hoon Kim, Jae-Hwan Kim, Yonggang Huang, and John A. Rogers*Add to Reading ListSource URL: rogers.matse.illinois.eduDownload Document from Source WebsiteFile Size: 1,20 MBShare Document on Facebook |
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