![Microtechnology / Technology / Plasma processing / Nanotechnology / Thin film deposition / Microelectromechanical systems / Etching / Chemical vapor deposition / Surface micromachining / Materials science / Chemistry / Semiconductor device fabrication Microtechnology / Technology / Plasma processing / Nanotechnology / Thin film deposition / Microelectromechanical systems / Etching / Chemical vapor deposition / Surface micromachining / Materials science / Chemistry / Semiconductor device fabrication](https://www.pdfsearch.io/img/695a592d23a3b880e21f93efaf80e7f1.jpg)
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City Palo Alto / / Company General Electric / difluoride HF / Union Carbide / Agilent Laboratories / SI / Agilent Technologies / Cu Ag / Ge / Vanadium / 3M / Corning / / Country United States / / Currency USD / / / Facility University of California at Berkeley / / IndustryTerm carrier gas / metal / plasma-enhanced chemical-vapor-deposition sccm / chemical-vapor-deposition / metal layer / chemical-vapor-deposited oxides / electronics industry / electronics / microelectromechanical systems / high-temperature processing / materials processing / difficult metal / silicon-wafer processing steps / low-pressure chemical-vapor deposisccm / / Organization University of California / African Union / Berkeley Sensor & Actuator Center / / Person Al O . Pyrex / A. J. Ricco / Ion Milled / / Position author / excellent electrical conductor / CPA / private consultant / Subject Editor / / ProvinceOrState California / / Technology MICROELECTROMECHANICAL SYSTEMS / MEMS / ATM / fuel cells / Digital Object Identifier / integrated circuits / CVD / Chemical vapor deposition / /
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