CPMI

Results: 86



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41

Improving the quality of barrier/seed interface by optimizing physical vapor deposition of Cu Film in hollow cathode magnetron A. Dulkin, E. Ko, L. Wu, I. Karim, K. Leeser et al. Citation: J. Vac. Sci. Technol. A 29, 041

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Language: English - Date: 2015-04-22 08:46:32
    42

    Etching mechanism of the single-step through-silicon-via dry etch using SF6/C4F8 chemistry Zihao Ouyang, D. N. Ruzic, Mark Kiehlbauch, Alex Schrinsky, and Kevin Torek Citation: Journal of Vacuum Science & Technology A 32

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    Language: English - Date: 2015-04-22 08:46:33
      43

      IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 40, NO. 4, APRILVisual and Electrical Evidence Supporting a Two-Plasma Mechanism of Vacuum

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        44

        JOURNAL OF APPLIED PHYSICS 103, 044901 共2008兲 Preliminary evidence of field induced rhenium etching by XeF2 at high vacuum C. H. Castano Giraldo,1,a兲 M. Aghazarian,2 and D. N. Ruzic2 1

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        Language: English - Date: 2015-04-22 08:46:31
          45

          Thermocapillary and thermoelectric effects in liquid lithium plasma facing components

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            46

            Debris transport analysis at the intermediate focus of an extreme ultraviolet light source John Sporre David N. Ruzic

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              47

              PDF Document

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                48

                730 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 40, NO. 3, MARCH 2012 Laboratory Investigation of Vapor Shielding for Lithium-Coated Molybdenum in Devex

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                  49

                  PRL 104, PHYSICAL REVIEW LETTERS week ending 5 MARCH 2010

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                    50

                    SCT-18013; No of Pages 4 Surface & Coatings Technology xxxxxx–xxx Contents lists available at SciVerse ScienceDirect Surface & Coatings Technology

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                    Language: English - Date: 2015-04-22 08:46:32
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