CPMI

Results: 86



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11Deposition of aluminum oxide by evaporative coating at atmospheric pressure (ECAP)

Deposition of aluminum oxide by evaporative coating at atmospheric pressure (ECAP)

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Source URL: cpmi.illinois.edu

Language: English - Date: 2015-04-22 08:46:32
    12Origin of defects on targets used to make extreme ultraviolet mask blanks He Yu, Daniel Andruczyk, David N. Ruzic, Vibhu Jindal, and Patrick Kearney Citation: Journal of Vacuum Science & Technology A 31, ); d

    Origin of defects on targets used to make extreme ultraviolet mask blanks He Yu, Daniel Andruczyk, David N. Ruzic, Vibhu Jindal, and Patrick Kearney Citation: Journal of Vacuum Science & Technology A 31, ); d

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    Source URL: cpmi.illinois.edu

    Language: English - Date: 2015-04-22 08:46:33
      13PHYSICAL REVIEW B 76, 205434 共2007兲 Collisional and thermal effects on liquid lithium sputtering J. P. Allain,1,* M. D. Coventry,2 and D. N. Ruzic2 1Argonne

      PHYSICAL REVIEW B 76, 205434 共2007兲 Collisional and thermal effects on liquid lithium sputtering J. P. Allain,1,* M. D. Coventry,2 and D. N. Ruzic2 1Argonne

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      Source URL: cpmi.illinois.edu

      Language: English - Date: 2015-04-22 08:46:31
        14Development and characterization of a secondary RF plasma-assisted closed-field dual magnetron sputtering system for optical coatings on large-area substrates

        Development and characterization of a secondary RF plasma-assisted closed-field dual magnetron sputtering system for optical coatings on large-area substrates

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        Source URL: cpmi.illinois.edu

        Language: English - Date: 2015-04-22 08:46:32
          15JOURNAL OF APPLIED PHYSICS 102, 023301 共2007兲 Lifetime measurements on collector optics from Xe and Sn extreme ultraviolet sources S. N. Srivastava,a兲 K. C. Thompson, E. L. Antonsen, H. Qiu, J. B. Spencer, D. Papk

          JOURNAL OF APPLIED PHYSICS 102, 023301 共2007兲 Lifetime measurements on collector optics from Xe and Sn extreme ultraviolet sources S. N. Srivastava,a兲 K. C. Thompson, E. L. Antonsen, H. Qiu, J. B. Spencer, D. Papk

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          Source URL: cpmi.illinois.edu

          Language: English - Date: 2015-04-22 08:46:31
            16Journal of Nuclear Materials xxxxxx–xxx Contents lists available at ScienceDirect Journal of Nuclear Materials journal homepage: www.elsevier.com/locate/jnucmat

            Journal of Nuclear Materials xxxxxx–xxx Contents lists available at ScienceDirect Journal of Nuclear Materials journal homepage: www.elsevier.com/locate/jnucmat

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            Source URL: cpmi.illinois.edu

            Language: English - Date: 2015-04-22 08:46:33
              173476 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 40, NO. 12, DECEMBER 2012 Characterization of an Atmospheric-Pressure Helium Plasma Generated by 2.45-GHz Microwave Power

              3476 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 40, NO. 12, DECEMBER 2012 Characterization of an Atmospheric-Pressure Helium Plasma Generated by 2.45-GHz Microwave Power

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              Language: English - Date: 2015-04-22 08:46:33
                18Journal of Nuclear Materials 390––1047 Contents lists available at ScienceDirect Journal of Nuclear Materials journal homepage: www.elsevier.com/locate/jnucmat

                Journal of Nuclear Materials 390––1047 Contents lists available at ScienceDirect Journal of Nuclear Materials journal homepage: www.elsevier.com/locate/jnucmat

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                Language: English - Date: 2015-04-22 08:46:32
                  19J. Micro/Nanolith. MEMS MOEMS 6!2

                  J. Micro/Nanolith. MEMS MOEMS 6!2", 023005 !Apr–Jun 2007" Plasma cleaning of lithium off of collector optics material for use in extreme ultraviolet lithography applications Martin J. Neumann

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                  Language: English - Date: 2015-04-22 08:46:31
                    20Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching H. Shin,a兲 S. N. Srivastava, and D. N. Ruzicb兲 Center for Plasma Material Interactions, University of Illinois

                    Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching H. Shin,a兲 S. N. Srivastava, and D. N. Ruzicb兲 Center for Plasma Material Interactions, University of Illinois

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                    Source URL: cpmi.illinois.edu

                    Language: English - Date: 2015-04-22 08:46:31